Ministry of Commerce of the People's Republic of China 
The SPIE Photomask Technology & Extreme UV Lithography Symposium 2025 will be held September 21-25, 2025 at the Monterey Conference Center in Monterey, California, USA. This is a high-profile trade show and conference focused on the photomask technology and extreme ultraviolet lithography sectors, and is an important networking platform for buyers and key suppliers of components, software and manufacturing equipment for the photomask industry. The exhibition will showcase the latest products related to photomask technology and extreme ultraviolet lithography, covering components, software and manufacturing equipment, etc. The conference part of the event will bring together industry experts, scholars and enterprise representatives to discuss the latest trends, technological breakthroughs and future development directions of the industry, as well as provide a wealth of academic presentations and seminars to share the latest research results and practical experience. In addition, the event provides participants with the opportunity to network with industry-leading companies and expand business cooperation. The Monterey Conference Center is a modern conference venue with excellent facilities and convenient transportation, providing participants with a comfortable conference environment and convenient services.
Date
- 2025.09.21-09.25
- 09.2026
- Founded in: /
- Interval: Once a year
Venue
- Monterey Conference Center
- America-Monterey
- Opening Hours: /
Industry
- Industry Sector
- Electric and Electronics (Products, Machinery),Optics, Optical Instruments, Laser
- Main Product Groups
- Electronic Design & Components Optoelectronics Micro & Nanotechnologies Sciences for Engineers - Research & Development
Sponsor
- SPIE (International Society for Optical Engineering)
- Tel ：+1 (360) 676-3290
- Fax：+1 (360) 647-1445
- customerservice@spie.org
- http://www.spie.org/
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